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Ion Implantation

/ˌaɪən ˌɪmplanˈteɪʃən/noun
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Ion implantation is a precise technique that involves accelerating ions and embedding them into a solid material to modify its atomic structure and properties, such as electrical conductivity or hardness. This process is a cornerstone of modern manufacturing, especially in creating faster and more efficient electronic devices, though it requires careful control to avoid unintended damage to the material.

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Ion implantation allows for the creation of materials that can withstand extreme conditions, like those used in spacecraft, and it's so precise that it can alter just a few atomic layers, enabling the production of microchips with over 50 billion transistors on a single piece the size of a fingernail.

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